电弧离子镀沉积Cr-O-N活性扩散阴挡层  

Cr-O-N FILMS DEPOSITED BY ARC ION PLATING AS ACTIVE DIFFUSION BARRIERS

作　　者：王启民[1] 郭明虎[1] 柯培玲[1] 孙超[1] 黄荣芳[1] 闻立时[1] 

机构地区：[1]中国科学院金属研究所金属腐蚀与防护国家重点实验室,沈阳110016

出　　处：《金属学报》2004年第12期1264-1268,共5页Acta Metallurgica Sinica

基　　金：中国科学院方向性课题资助项目KGCX2-212-02

摘　　要：采用电弧离子镀技术在NiCoCrAlY涂层与高温合金基材DSMll间沉积不同成分的Cr-O-N薄膜作为扩散阻挡 层,研究了900℃下氧化1400 h后DSMll／Cr-O-N／NiCoCrAlY体系中Cr-O-N层阻挡合金元素互扩散的行为以及阻 挡层对涂层氧化动力学曲线的影响.结果表明, Cr-O-N层在高温氧化过程中生成与涂层和基材有良好结合的富Al氧化物层, 可以阻挡DSMll基体与NiCoCrAlY涂层间的元素互扩散,起到活性阻挡层的作用;Cr-O-N层中O和N含量影响生成 富Al氧化物层的连续性和致密性,从而影响其阻挡元素互扩散的性能.几种成分的Cr-O-N活性扩散阻挡层对NiCoCrAlY 涂层900℃下的高温氧化性能都有一定的改善作用,改善程度与阻挡层阻挡合金元素互扩散的程度保持一致.Cr-O-N films with different chemical composition were deposited using arc ion plating (AIP) between NiCoCrAlY coatings and the DSM11 substrate as diffusion barriers. The inhibition effects of the diffusion barriers on the interdiffusion of the alloy elements in the DSM11/CrO-N/NiCoCrAlY system were studied after exposured at 900 degreesC for 1400 h. The influences of the barriers on the oxidation kinetics were also investigated. The results indicate that the Cr-O-N layers can change into Al-rich oxide layers with active bonding with the coatings and the substrates during the high temperature exposure. The Al-rich oxide layers hindered the interdiffusion of the alloying elements between DSM11 substrate and NiCoCrAlY coating. Thus the Cr-O-N layers can act as active diffusion barrier. The O and N compositions in the Cr-O-N layer affect the continuity and density of the Al-rich oxide layers, and influence the inhibition effect of the diffusion barriers accordingly. All the Cr-O-N barriers decreased the weight gain of the NiCoCrAlY coatings at 900 degreesC. The improvement extent of the Cr-O-N barriers on the oxidation behavior of the NiCoCrAlY coatings is corresponding with the inhibition capacity of the barriers.

关 键 词：Cr-O-N 活性扩散阻挡层 电弧离子镀 

分 类 号：TG111.5[金属学及工艺—物理冶金] TG174.44[金属学及工艺—金属学]