HIRFL注入器高频腔体与高频机的匹配  

Matching for the generator and RF cavity in HIRFL injector

作　　者：赵建民[1] 苏学明[1] 王世贤[1] 王贤武[1] 杨维青[1] 张智明[1] 

机构地区：[1]中国科学院近代物理研究所,甘肃兰州730000

出　　处：《强激光与粒子束》2005年第1期140-144,共5页High Power Laser and Particle Beams

基　　金：兰州重离子加速器改造工程项目资助课题

摘　　要：叙述了兰州重离子加速器注入器(SFC)高频系统的200kW高频机与高频腔体的功率匹配,匹 配测量系统的工作原理,以及对匹配系统的改进和完善,并对高频腔体的输入阻抗和耦合电容进行了计算。为 提高高频系统的稳定性和可靠性,对影响高频功率传输和D电压提高的问题进行了深入的研究和改进。采用 矢量阻抗仪冷态测量腔体匹配阻抗的方法和一些相应的技术和措施,用矢量电压表动态测量功率输出级的相 位差,判断D电路是否工作在匹配状态,从而使SFC的D电压由原来的50～65kV(不稳定)提高到稳定工作 的105kV,改善了SFC的工作状态和保证了SFC的高效运行。This paper describes power matching of the 200 kW generator and RF cavity of HIRFL Injector RF system, working principle of matching measure system as well as matching system improvement. It further calculates the input impedance and coupling capacitor of the RF cavity. In order to enhance the reliability and stability in RF system, the problem of D voltage-enhancement and RF power transmission, etc are researched. The vector impedance meter is used to measure the cavity matching impedance and the vector voltage to dynamically measure the phasing errors of the power output, then that the D circuit is working at the matching stage can be ensured. With the D voltage of SFC raising from 50-65 kV (unstable) to 105 kV (stable), SFC's high efficiency is guaranteed.

关 键 词：注入器 谐振腔 输入阻抗 功率传输 阻抗匹配 高频电压 

分 类 号：TL503.2[核科学技术—核技术及应用]