用增强质子背散射研究注氦纳米晶钛膜中氦的含量  

Study of the Preservation of Helium Implanted in Nanocrystal Titanium Film by Enhanced Proton Backscattering Spectrometry

作　　者：段艳敏[1] 刘慢天[1] 龙兴贵[2] 吴兴春[2] 罗顺忠[2] 刘东剑[1] 吴英[1] 郑思孝[1] 刘宁[1] 安竹[1] 

机构地区：[1]四川大学原子核科学技术研究所.辐射物理及技术教育部重点实验室 [2]中国工程物理研究院核物理与化学研究所

出　　处：《四川大学学报（自然科学版）》2005年第1期112-116,共5页Journal of Sichuan University(Natural Science Edition)

基　　金：中国工程物理研究院科学技术重大项目基金(2003Z0501) 通讯作者

摘　　要：作者使用增强质子背散射方法,分析了几种Mo基体纳米钛膜中氦的保持量情况.结果表明:采用离子注入法注入的氦在纳米钛膜中能保存较长的时间,氦的释放速率受氦在钛膜及基体中的分布、钛膜中氦浓度大小的影响;Ar,He混合气体放电法工作参数的选择可影响渗氦的效率.The preservation dose of helium implanted in several nanocrystal titanium films deposited on Mo substrates is analyzed by enhanced proton backscattering spctrometry. The result demonstrates that the implanted helium can be preserved for a long time in nanocrystal titanium films and its release speed is affected by the ion implantation energy, the thickness of nanocrystal titanium films and the helium concentration in nanocrystal titanium films. The choice of parameters in Ar-He gas discharge method for helium implantation is very important, which has a crucial role on the helium implantation into nanocrystal titanium films.

关 键 词：增强质子背散射 氦离子注入 纳米晶钛膜 保持剂量 释放速率 

分 类 号：TL99[核科学技术—核技术及应用] O741[理学—晶体学]