热处理对静电自组装SiO_2光学薄膜的影响  

Effect of Heat-treatment on SiO_(2) Optical Thin Film Prepared with Electrostatic Self-Assembly Multilayer Method

作　　者：许丕池[1] 卢忠远[1] 何方方[1] 王兵[1] 

机构地区：[1]西南科技大学材料学院,四川绵阳621010

出　　处：《四川大学学报（自然科学版）》2005年第1期133-138,共6页Journal of Sichuan University(Natural Science Edition)

基　　金：国防基础科学研究项目(K12030611091);西南科技大学引进人才科研启动基金项目(ZK043073);湖北省自然科学基金资助项目(2000J002)

摘　　要：以正硅酸乙酯(Ethylsilicate,TEOS)为原料,乙醇为溶剂,NH3·H2O为催化剂,乙醇水溶液为稀释剂制备了胶粒带负电荷、浓度为0.01g/mL的SiO2溶胶.在低折射率(1.45)的玻璃基片上用静电自组装(ElectrostaticSelf AssemblyMultilayer,ESAM)法制备了带正电荷的聚电解质聚二烯丙基二甲基氯化铵PDDA与SiO2的有机/无机复合薄膜.然后在不同温度下对其进行热处理.分别用A型缩合热分析仪(TG DTA)、透射电镜(TEM)、傅立叶红外光谱仪(FT IR)、椭偏仪(TP 77型椭圆偏振光测厚仪)、721分光光度计、Nd:YAG激光器研究了温度对薄膜结构、组成、折射率、光学性能、机械强度以及激光损伤阈值的影响.得到了多孔、折射率低(1.27)、抗机械损伤强度大、激光损伤阈值高(68J/cm2)、透光性好(99.2%)的SiO2光学增透薄膜.SiO_(2) colloidal solution were prepared, catalyzed by hydrolysis of Ethyl Silicate (Si(OC_(2)H_(5))_(4),TEOS), using NH_(3)·H_(2)O as catalyser, ethanol as solvent, the mixed liquor of ethanol and ditilled water was used to dilute the sol. The concentration of sol was 0.01g/mL, the particles of SiO_(2) in sol possesses negatives charge. Polyelectrolyte [Poly(diallyldimethylammonium chloride), PDDA] possessing positive charges and SiO_(2) complex films were fabricated on glass substrates via the electrostatic self-assembly multiplayer (ESAM) technique. SiO_(2) optic anti-reflective thin films were formed by heat-treating under different temperature less 520℃.The micro-structure, constitute, refractive index and thickness, anti-scratch intensity, laser damage threshold and light transmittance of the SiO_(2 ) films are characterized by thermal analyzer(DTA-TG), transmission electron microscopy(TEM), Fourier transform infrared(FT-IR), ellipsometry, Nd∶YAG laser damage facility 721spectrophotometer respectively. The experimental results show that the anti-scratch intensity, laser damage threshold, light transmittance are further improved after heat-treatment. PDDA /SiO_(2) complex thin film of 20 bilayers was heat-treated under 300℃ possesses the most high anti-scratch intensityand refractive index, under 400℃ possesses the most high light transmittance (99.2%)at wavelength 520nm, under 500℃ possesses the most high laser damage threshold(68J/cm^(2)).

关 键 词：SIO2 静电自组装 热处理 增透膜 

分 类 号：O647[理学—物理化学]