电感耦合等离子体质谱法测定高纯金属铋中痕量杂质元素  

Determination of Trace Impurities in High Purity Bismuth by Inductively Coupled Plasma Mass Spectrometry

作　　者：易永[1] 章新泉[1] 苏亚勤[1] 姜玉梅[1] 李翔[1] 刘永林[1] 

机构地区：[1]江西省分析测试研究所,南昌330029

出　　处：《分析科学学报》2005年第1期90-92,共3页Journal of Analytical Science

摘　　要：采用电感耦合等离子体质谱法测定了高纯金属铋中14种痕量杂质元素。考察了基体效应对测定元素的干扰影响,通过铋基体元素的分离和以Sc、In、Eu作为内标,有效克服了干扰现象。方法的检出限在0.1～4.7ng/mL;精密度在1.4%～5.0%;加标回收率在89%～114%范围。本法可满足99.999%以上金属铋中痕量杂质测定的要求。A method for the trace impurities in high purity bismuth by inductively coupled plasma mass spectrometry (ICP-MS) was developed, while the matrix bismuth was separated. Using Sc,In and Eu as internal standard, the interference due to the effects of matrix could be corrected efficiently. The instrumental parameters and effects of matrix have been studied. Recoveries of standard addition were 89%～114%, the detection limit was 0.1～4.7 ng/mL and the RSD was 1.4%～5.0%. The method has been applied to the determination of trace impurities in bismuth samples with purity above 99.999%.

关 键 词：电感耦合等离子体质谱 金属铋 痕量杂质 

分 类 号：O657.63[理学—分析化学] O614.532[理学—化学]