硫化钠浓卤蒸发过程中消除结疤的研究  

Research of Scale Deposition Eliminated for Evaporation of Sodium Sulphide Brine

作　　者：马茜[1] 李彦威[1] 马秀卿 

机构地区：[1]太原工业大学应用化学系

出　　处：《太原工业大学学报》1993年第2期92-96,共5页

摘　　要：本研究是以BaS为净化剂,清除浓卤中的杂盐,以解决硫化钠蒸发过程中的结疤问题。本法所采用的工艺简单、效果明显。同时,用BaS作净化剂,不仅原料价格便宜,来源广泛,而且对硫化钠产品的质量和产率均有所提高。In this resasch, the scale deposition is eliminated by using BaS as Purifying agent to get rid of the soluble miscellaneous salts in concent rat ed brine of sodium sul Phide. This technical method instead of the original ones could simplify the operational procedure and yield good results.At the same time , not only the raw material of Bas is cheap and extensive but also the guality of Na2S and the productive rate due to introduce S2- ion into the procedure raise evidently

关 键 词：硫化钠 浓卤 净化剂 结疤 

分 类 号：TQ131.12[化学工程—无机化工]