二氧化钛薄膜的低温制备及其性能表征  

Preparation of TiO_2 Thin Films at Low Temperature and Characterization of Their Properties

作　　者：鲍兴旺[1] 张金龙[1] 梁学海[1] 黄家祯[2] 张利中[2] 

机构地区：[1]华东理工大学精细化工研究所,上海200237 [2]华东理工大学分析测试中心,上海200237

出　　处：《物理化学学报》2005年第1期69-73,共5页Acta Physico-Chimica Sinica

基　　金：国家自然科学基金(20073026)上海市教委资助项目~~

摘　　要：通过水煮法在较低温度下制备了均匀、透明的 TiO_2-SiO_2复合薄膜，利用 XRD、AFM 和 UV-Vis 光谱等手段对薄膜的物相、表面形态结构和透明性进行了表征，分析了 SiO_2的添加对薄膜性质的影响，并利用紫外光照降解罗丹明 B 溶液评价了薄膜的光催化活性及其影响因素，实验结果表明，通过水煮法在较低温度下制备的薄膜具有较高的光催化活性，适量 SiO_2的添加能够提高薄膜的光催化活性。TiO2 and TiO2-SiO2 thin films were prepared at low-temperature with hot water treatment. Their crystal structure, surface morphology and transparency were characterized by XRD, AFM and UV-Vis spectra respectively, and the effects of addition of SiO2 in the films on their performances after treatment with hot water were analyzed. The evaluations of photocatalytic activities of thin films were carried out by degradation of rhodamine B in water solution under UV irradiation. The results showed that the thin films prepared at low temperature with hot water treatment have high reactivitity for degradation of rhodamine B and the addition of SiO2 can significantly increase the photocatalytic reactivitity.

关 键 词：水煮处理 TiO2-SiO2复合薄膜 AFM低温制备 光催化 

分 类 号：O643.3[理学—物理化学]