锆中铪的原子发射光谱分析法  

Determination of hafnium in zirconium with atomic emission spectrometry

作　　者：王长华[1] 钱伯仁[1] 潘元海[1] 

机构地区：[1]北京有色金属研究总院,北京100088

出　　处：《分析试验室》2004年第12期51-54,共4页Chinese Journal of Analysis Laboratory

基　　金：科技部分析测试新技术新方法课题

摘　　要：研究了在氩氧控制气氛条件下锆中铪的分析条件,对氩氧比、激发电流、曝光时间等实验参数进行了选择。在选定条件下对实际试样进行分析,回收率在90%～113%之间,相对标准偏差小于5%,方法可用于锆中铪的质量分数为0 005%～5 0%的实样分析。A method for determination of hafnium in zirconium under Ar-O_2 controlled atmosphere was developed and the conditions of ratio of Ar-O_2, excited current and exposed time were optimized. Under the selected conditions two samples were analyzed and the relative standard deviation was less than 5% with recovery of 90%～113%. This method could be applied to the determination of hafnium over the range between 0.005% and 5%.

关 键 词：锆 铪 氩氧控制气氛 直流电弧原子发射光谱 

分 类 号：O557.31[理学—热学与物质分子运动论]