The Properties of the Rectangular Arc Ion Plating with Magnetic Filtering Shutter  

作　　者：石中兵 童洪辉 刘小波 熊涛 李勇 严复秀 赵燕 杨作贵 

机构地区：[1]Southwestern Institute of Physics, Chengdu 610041, China

出　　处：《Plasma Science and Technology》2004年第6期2581-2584,共4页等离子体科学和技术（英文版）

摘　　要：A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter system to filter macroparticles are studied. It is proposed that the macroparticles in the plasma beam are effectively removed with the magnetic filtering shutter system, and the quality of the deposited films is improved.A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter system to filter macroparticles are studied. It is proposed that the macroparticles in the plasma beam are effectively removed with the magnetic filtering shutter system, and the quality of the deposited films is improved.

关 键 词：magnetic filtering shutter cathodic vacuum arc macroparticles removal plasma 

分 类 号：O462[理学—电子物理学]