聚合物阵列波导光栅波分复用器的研究  

Investigation of polymer arrayed waveguide grating multiplexer

作　　者：陈开鑫[1] 赵禹[1] 崔占臣[2] 张大明[1] 马春生[1] 刘式墉[1] 衣茂斌[1] 

机构地区：[1]吉林大学集成光电子学国家重点联合实验室,吉林长春130023 [2]吉林大学化学学院,吉林长春130023

出　　处：《吉林大学学报（信息科学版）》2002年第1期8-12,共5页Journal of Jilin University（Information Science Edition）

基　　金：国家重点基础发展规划项目 (G2 0 0 0 0 3 660 4);国家高技术研究发展计划资助项目 (2 0 0 1AA3 12160 )

摘　　要：利用甲基丙稀酸甲酯 -甲基丙稀酸缩水甘油酯共聚物制作聚合物光波导 ,对聚合物阵列波导光栅波分复用器的原理、版图设计及制作工艺进行了研究。设计了聚合物阵列波导光栅的版图 ,并利用厚胶掩模和铝掩模两种工艺完成了聚合物阵列波导光栅光波导的制作。实验结果证明 ,与厚胶掩模相比 ,铝掩模具有较好工艺重复性 ,同时也更能实现设计所要求的参数。The theory, the design and the fabrication procedure of polymer arrayed waveguide grating (AWG) were investigated by the use of epoxypropyl methylacrylate co methyl methacrylate polymer and bisphenyl A epoxy mixture to fabricate polymer waveguide. The photolithography mask of AWG was designed. And the polymer waveguide of AWG was fabricated by utilizing both the thick photoresist and aluminum film to form the mask that was used in O 2 reactive ion etching. The results show that comparing with the thickness photoresist, the conditions of the fabrication of waveguide can be well repeated and the dimensions of the waveguide are more close to the design parameter, when aluminum film is used to form the mask.

关 键 词：波分复用器 光波导 列阵波导光栅 聚合物 

分 类 号：TN256[电子电信—物理电子学]