X射线衍射-拉伸法测薄膜应力  

Measurement of Thin Film Stress by XRD Method Combined with Tensile Testing

作　　者：王张敏 李戈扬[1] 漆璿[1] 李鹏兴[1] 

机构地区：[1]上海交通大学,上海200030

出　　处：《物理测试》1993年第4期171-174,共4页Physics Examination and Testing

摘　　要：薄膜应力的测量一直是一个困难的问题。本文尝试用一种新的方法——X射线衍射-拉伸法,对薄膜的应力进行检测,与侧倾法实验结果相比较,X射线衍射-拉伸法更为准确与可靠。The measurement of thin film stress is always a problem with great difficulty. In this paper, a new method——the XRD method combined with tensile testing was used for the determination of thin film stress. The results of this test are more reliable compared with those of sldeinclination method.

关 键 词：X射线衍射 拉伸试验 薄膜 应力 

分 类 号：TG115.222[金属学及工艺—物理冶金]