Ti-46.5Al-2.5V-1.0Cr合金的辉光离子渗氮  

Plasma-Nitration Process of Ti-46.5Al-2.5V-1.0Cr Alloys

作　　者：曹磊[1] 刘宗茂[2] 毛磊[2] 孙世清[2] 邢国志 

机构地区：[1]河北科技大学后勤管理处,河北石家庄050054 [2]河北科技大学材料科学与工程学院,河北石家庄050054 [3]河北冶金研究院,河北石家庄050030

出　　处：《河北科技大学学报》2004年第4期30-32,共3页Journal of Hebei University of Science and Technology

基　　金：河北省教育厅基金资助项目(990111)

摘　　要：研究了Ti 46.5Al 2.5V 1.0Cr合金的辉光离子渗氮,气氛为NH3。当采用900℃×9h工艺参数时,渗层硬度值可达1097HV,与基体相比,耐磨性提高2.5倍,渗层深度可达10μm以上,与高温气体渗氮相比,渗氮时间缩短至1/5,渗层深度增加到2.5倍。The plasma-nitration process of Ti-46.5Al-2.5V-1.0Cr alloys in ammonia has been investigated. Compared to the high temperature gas nitration, this progress is shortened by one fifth and the depth of nitrided case is increased by 2.5 times. It has been found that the specimen handled in 900 ℃×9 h can achieve its hardness to 1 097 HV and its depth of nitrided case can achieve more than 10 microns. Compared to the original alloy, the wear-resisting property is increased by 2.5 times.

关 键 词：离子渗氮 渗层深度 合金 基体 耐磨性 工艺参数 硬度值 高温气体 NH3 气氛 

分 类 号：TG156[金属学及工艺—热处理] TG161.86[金属学及工艺—金属学]