球形真空镀汞膜电极基体对电极性能的影响  

STUDY ON INFLUENCE OF ELECTRODE PERFORMANCE ON SPHERE MERCURY FILM PLATED SUBSTRATE

作　　者：周志仁[1] 杨学群[1] 钟新华 

机构地区：[1]湘潭大学中心实验室

出　　处：《湘潭大学自然科学学报》1993年第1期109-112,共4页Natural Science Journal of Xiangtan University

摘　　要：本文在研制真空镀汞膜电极中,用金锑钨钼银镍作为镀汞膜电极垂体.着重研究了这些不同金属基体所制出电极的性能,用25次微分溶出新极谱法对电极使用寿命,膜条件选择性、重视性及酸碱适合范围作了全面分析和比较.In this paper the character of nickel,gold,platinum,wolfram,stibium,silver as base of the electrode on mercury film platedsubstrate in low-vacuum has been developed.The properties of theelectrode are examined by anodic stripping neopolarography.Theseelectrode keep good stability,high sensitivity and good reproducibility.

关 键 词：电化学分析 真空镀膜 汞膜电极 

分 类 号：O646.5[理学—物理化学]