热处理温度对ITO薄膜组织与光电性能的影响  

Effect of Temperature of Heat Treatment on Microstructure and Optical-electrical Properties of ITO Thin Films

作　　者：杨觉明[1] 张康虎[2] 余申卫[2] 余萍[1] 张海礁[1] 

机构地区：[1]西安工业学院材料与化工学院,陕西西安710032 [2]中国船舶重工集团公司第十二研究所,陕西兴平713102

出　　处：《热加工工艺》2004年第12期26-28,共3页Hot Working Technology

基　　金：陕西省教育厅科技专项基金资助项目(02JK147)

摘　　要：采用溶胶-凝胶工艺制备出纳米晶ITO透明导电薄膜。采用XRD和SEM分析了薄膜物相和显微形貌。采用面电阻仪和分光光度计测量了薄膜方阻和透光率。实验结果表明,随热处理温度升高,晶化趋于完整,组织逐渐均匀致密,晶粒有所长大,700℃热处理时薄膜完全晶化。另外,随热处理温度升高,方阻减小而透光率增加。经过700℃热处理,厚度400nm的ITO膜的方阻约300Ω/□,透光率>80%。The transparent conductive ITO thin films with less than 300Ω/□ of the sheet resistance and more than 80% of the visible tran smittance were prepared by a sol-gel process. The microstructure and phase of the films were analyzed by XRD and SEM. The sheet resistance and optical transmittance of the films were measured by the four-point probe method and spectrophotometer. The results show that the microstructure of the films homogenizes and crystallizes, the grains of the film are growth gradually, and optical transmittance of the films is also increase with increasing the temperature. On the other hand, the sheet resistance of the films is decrease with increasing the temperature.

关 键 词：铟锡氧化物 溶解-凝胶工艺 透明导电膜 方阻 透光率 

分 类 号：TB383[一般工业技术—材料科学与工程]