XeCl准分子激光器钝化中的返潮现象  

Moisture Regain During Passivation of XeCl Laser

作　　者：熊旭明[1] 聂劲松[1] 马树森 王广昌 秦玉英 张兆平 

机构地区：[1]中国科学院安徽精密光学机械研究所,合肥230031

出　　处：《应用激光》1993年第6期253-254,共2页Applied Laser

基　　金：国家自然科学基金;中科合肥分院院长基金

摘　　要：本文指出XeCl激光器钝化过程中激光器金属部件的氧化膜与HCl的反应是返潮现象的重要原因。分析了返潮现象对器件的危害及消除方法。The Moisture regain during the passivation of XeCl laser is reported and ascribedmainly to the reaction between HCl and oxide coating on the surface of metal parts in laser. Adiscusion is given to the peril of moisture regain as well as th methodes of getting rid of the oxide.

关 键 词：准分子激光 钝化 返潮 

分 类 号：TN248.22[电子电信—物理电子学]