CH_4,CH_3Cl,CHCl_2F,CF_4在0.8—2.0MeV^4He^+束流轰击下碳原子KLL俄歇电子产生率和化学环境的影响  

THE EFFECT OF CHEMICAL ENVIRONMENT ON THE KLL AUGER YIELDS OF CH_4 ,CH_3Cl,CHCl_2 F,CF_4 ,BOMBARDED BY 0.8-2.0MEV 4He^+ PARTICLES

作　　者：翟林桦 王丽君[1] 方建勋[1] 张亚增[1] 郭明 吴震 

机构地区：[1]安徽师范大学物理系 [2]Baylor University U.S.A

出　　处：《原子与分子物理学报》1993年第1期2568-2574,共7页Journal of Atomic and Molecular Physics

摘　　要：实验测量了CH_4,CH_3Cl,CHCl_2F,CH_4在0。8—2。0MeV^4He^+束流轰击下碳原KLL俄歇电子产生率,结果表明产生率随碳原子化学环境的不同有明显的差别,CH_4和CHCl_2F,CF_4的俄歇电子产生率差异达30%以上。这种差异和非弹性散射修正或碳原子外层有效价电子校正结果均相符合,虽然前者符合可能稍好。测量结果显示可能存在其他因素或综合因素对产生率的影响。The Carbon KLL Auger yields from CH4, CH3Cl, CHCl2F and CF4 have bees measured for 4He+ bombardment in the incident energy range of 0.8-2.0 MeV.The yields are seen to vary significantly with the chemical environments with variations greater than30% between CH4 and CHCl2F,CF4 yields. The variation seem to be reproducible by two scaling laws, that based op the inelastic scattering of Auger electrons by the various molecular components and that uses the effective numberof valence-shell electrons about the site of the K-shell vacancy, although the inelastic one seems to be better.The measurement seems to show signs of exiostance of other factors or combined factors concernig tkese variations.

关 键 词：碳原子 俄歇电子 离子束 化学环境 

分 类 号：O562.4[理学—原子与分子物理]