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机构地区:[1]南开大学电子材料系,天津300071 [2]理化工程研究院 [3]南开大学物理系,天津300071
出 处:《真空科学与技术》1993年第4期268-271,共4页Vacuum Science and Technology
摘 要:在银基底上蒸镀80nm的金薄膜,然后用不同温度和时间间隔对这些样品进行热处理。再用PHI 550型俄歇电子能谱仪测出上述样品金膜中银的浓度剖面分布。根据银的浓度剖面分布及Hall公式算出Au-Ag系统的互扩散系数。由Leclaire公式计算出该系统的晶界扩散系数。从Arrhenius方程得出互扩散及晶界扩散激活能。并对实验和计算结果进行了讨论。80nm gold thin films had been deposited onto the silver substrates, then thespecimens have been treated at different temperstrues and different intervals of time. After that the above samples have been analysed by AES (type PHI 550)and silver concentration profiles in the gold films have been obtained. According to the profiles and Hall formula the interdiffusion coefficients have been calculated and the relative grain boundary diffusion coefficients of the system have been determined by the Leclaire's formula. And the energies of interdiffusion and grain boundary diffusion have been figured out by the Arrhenius equation. The results of experiments and calculation have also been discussed in this paper.
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