聚合物基质中TMP分子的光谱烧孔特性研究  

Persistent spectral hole-burning of tetramethoxyphenyl porphin in a polymeric host

作　　者：陈凌冰[1] 赵有源[1] 王国益 潘玉莲[1] 李富铭[1] 房建华 李军 潘道成[2] 

机构地区：[1]复旦大学物理系,上海200433 [2]上海交通大学应用化学系,上海200030

出　　处：《中国激光》1993年第6期447-452,共6页Chinese Journal of Lasers

基　　金：国家863计划基金;国家自然科学基金资助课题

摘　　要：本文报道聚合物基质中四—对甲氧基苯基叶吩在液氦温度下的持久性光谱烧孔。考察了光谱孔的功率饱和与功率加宽效应。测量了成孔的动力学过程和光致擦除规律。对实验结果进行了拟合计算和讨论。Persistent spectral hole-burning is reported for the organic guest molecule 5, 10, 15, 20-tetra-(p-methoxyphenyl) porphin (TMP) imbeded in polymethylmethacrylate (PMMA) host at liquid helium temperature. The effects for power saturation of hole depth and power broadening of hole width were observed. Hole growth dynamics was investigated and the process of light induced hole erasing was measured. Theoretical fits to the experimental data were carried out and hole burning mechanism of the system was discussed.

关 键 词：光谱烧孔 氧基苯基卟吩 光存贮 

分 类 号：O63[理学—高分子化学]