离子氮化对镀铬层组织与性能的影响  

The Effects of Plasma Nitriding on the Structure and Properties of Electrodeposited Chromium Film

作　　者：葛继平[1] 

机构地区：[1]大连铁道学院

出　　处：《表面技术》1994年第6期260-264,共5页Surface Technology

摘　　要：研究了镀铬层经离子氮化后的组织和性能。分别用SEM、电子探针和X光衍射仪观察和分析了复合处理层剖面的组织、结构和成分,试验结果表明:离子氮化能使镀铬层的网状裂纹弥合,可明显提高了镀层表面硬度、结合力和耐蚀性。The effects of plasma nitriding on the structure and properties of electrodeposited Chromium film were studied. The profile morphology,element distribution and stucture were examined by X-ray Diffractormeter. Electron Microprobe and SEM. It was proved that plasma nitriding can sig-nificantly enhance surface hardness and binding force and improve corrosion resistance.

关 键 词：镀铬 氮化 镀层 性能 

分 类 号：TQ153.11[化学工程—电化学工业]