贴壁培养细胞免疫电镜标本制备的原位包埋法  

In Situ Embeding Method for Immunoelectron Microscopy for Monolayer Cultured Cells

作　　者：赵燕妮[1] 王明武[1] 

机构地区：[1]中国医科大学电镜中心实验室

出　　处：《电子显微学报》1994年第4期314-315,共2页Journal of Chinese Electron Microscopy Society

摘　　要：贴壁培养细胞免疫电镜标本制备的原位包埋法赵燕妮，王明武（中国医科大学电镜中心实验室，沈阳１１０００１）本文介绍了一种简便、适于制备贴壁培养细胞免疫电镜标本的原位包埋法。该法以原位包埋为基础，避免了通常方法在免疫染色前对细胞膜的机械损伤，从而保证了细胞...Nere we introduce a simple,applicable method for sample preparation of immunoelectron microscopy formonolayer cultured cells. Based on the in situ embeding method, this technique avoids mechanic damage to cellmembrane during the routine preparation procedure and can guarantee the perfect labeling of immunogold on cellsurface. As a experimental model, it is especially suitable for immunoelectron microscopic observation of the ef-fect of various factors on the properties of cell surface antigen.

关 键 词：细胞培养 贴壁培养细胞 标本 原位包埋法 

分 类 号：Q－34[生物学]