电子束真实发射度测量原理  

THE PRINCIPLE OF MEASUREMENT OF ELECTRON BEAM ACTUAL EMITTANCE

作　　者：刘乃泉[1] 伏亮[1] 过志秀 戴建枰 陈欣 

机构地区：[1]清华大学物理系

出　　处：《核科学与工程》1994年第1期78-85,8,共8页Nuclear Science and Engineering

摘　　要：描述了一个新的发射度测量方法.它包括有磁扫描系统,厚窄缝,荧光屏以及CCD图像处理系统.这个方法能够测量出电子束的真实发射度图形.文章设计了磁扫描系统,估计了束流通过磁扫描系统引起的发射度增长,还讨论了为阻挡高能电子穿透,窄缝必须选择的厚度.电子束发射度的测量对于自由电子激光以及其它对束流品质要求较高的加速器装置都是很重要的.This paper describes the measurement principle of the actual emittance of the relativistic electron beams. It consists of a magnetic scanning system, a thick slit, a fluorescent screen and a CCD image processing system. It can measure the actual emittance pattern of the electron beam.In this paper, we have designed the scanning magnets, calculated the emittance growth caused by the magnetic scanning system and discussed how thick the slit is required to prevent the electron beam with high energy. This measurement is very importmant for Free Electron Lasers and other accelerator facilities which require the electron beams with high qualities.

关 键 词：发射度 电子束 束流诊断 

分 类 号：TL501[核科学技术—核技术及应用]