离子束辅助沉积Fe－N薄膜的相形成  

FORMATION OF IRON NITRIDE FILMS BY ION BEAM ASSISTED DEPOSITION

作　　者：江海[1] 武庆兰[1] 陶琨[1] 李恒德[1] 

机构地区：[1]清华大学

出　　处：《金属学报》1994年第6期B273-B276,共4页Acta Metallurgica Sinica

摘　　要：用离子束辅助沉积方法合成Ｆｅ－Ｎ薄膜，用离子束背散射和Ｘ射线衍射方法分析薄膜成分和结构．结果表明，薄膜的组分（α－Ｆｅ，ζ－Ｆｅ２Ｎ，ε－Ｆｅ（２－３）Ｎ，γ＇－Ｆｅ４Ｎ相等）取决于沉积参数。给出了沉积温度和Ｎ／Ｆｅ原子到达比组成的相区域图．The composition and structure of the Fe-N films were investigated by RBS and XRD.The results of XRD shown that the films consist of γ'-Fe4N, ε-Fe2-3N and ζ-Fe2N phases or mixture of these phases under different deposition parameters. A phase region diagram in dependence on deposition temperature and N / Fe atomic arrival ratio was proposed.

关 键 词：氮化铁 离子束 辅助沉积 磁性薄膜 

分 类 号：TB43[一般工业技术]