薄膜应力应变曲线和基本力学性能测试  

Determination the Fundamental Mechanical Properties of Thin Films

作　　者：刘宝琛[1] 史训清[1] 

机构地区：[1]清华大学

出　　处：《实验力学》1994年第1期1-7,共7页Journal of Experimental Mechanics

基　　金：国家自然科学基金

摘　　要：本文采用白光散斑和数字散斑两种方法测量了厚度在（ｌｍ—６０μｍ）之间康铜孤立膜和其上喷镀ＴｉＯ２后复合膜的应力应变曲线，并成功地利用一种新方法—复合材料分离法由孤立膜和复合膜应力应变曲线分离出ＴｉＯ２膜的应力应变曲线，同时给出了它们的基本力学性能（如Ｅ，σｓ，ｂ，Ｋｃ），测量结果表明这一方法对于微电子及其组件中常用的薄膜（ｌμｍ—６０μｍ）及超薄膜（０．１μｍ—１μｍ）的应力应变和基本力学性能的测量有普遍意义。In this paper, stress-strain curves of simple foils (thickness 1-60 m)and compound films,i. e. same foils plated with thin layer of TiO2, are measured by means of white light speckle and digit speckle correlation.From these results, the stress-strain curves of TiO2 films are determined by a new dissociated method of compound material. And,the fundamental mechanical parameters (E, as, oh, Kc, etc. ) of them are obtained. The results show that this method is successful.

关 键 词：薄膜 应力应变曲线 力学测量 

分 类 号：O484.5[理学—固体物理]