低能氮离子和氩离子注入胸腺嘧啶和尿嘧啶的剂量效应  

DOSE EFFECT OF N^+ AND Ar^+ IMPLANTATION INTO THYMINE AND URACIL

作　　者：王卫东[1] 刘磊安[1] 薛建明[2] 张灵帅[1] 秦广雍[1] 赖江南[2] 林树[2] 王宇钢[2] 魏雄辉[3] 

机构地区：[1]河南郑州大学离子束生物工程省重点实验室,河南郑州450052 [2]北京大学重离子物理所,北京100871 [3]北京大学化学与分子工程学院,北京100871

出　　处：《核农学报》2005年第1期49-51,32,共4页Journal of Nuclear Agricultural Sciences

基　　金：国家"十.五"科技攻关项目 (2 0 0 1BA3 0 2B 0 3 )资助

摘　　要：本文研究了低能N+ 和Ar+ 注入对胸腺嘧啶和尿嘧啶的剂量效应 ,并分别给出了在考虑离子对样品的溅射和损伤的情况下的拟合曲线。通过对不同剂量处理的溅射和损伤系数的改变 ,可以对辐照的剂量曲线进行较好的拟合。研究还发现胸腺嘧啶和尿嘧啶对低能N+ 和低能Ar+ 的辐射敏感性不同。The dose-effect of the implantation of N+ and Ar+ on thymine and uracil were studied in this paper. Simulative curves were given when the sputtering of the intact sample molecules and the decomposition of the sample were taken into account. The simulative curves were fit for dose-effect curves when the sputtering and damage parameters change. It was also found that thymine and uracil had different sensitivities to N+ and Ar+.=

关 键 词：尿嘧啶 剂量效应 注入 损伤 不同剂量 改变 辐射敏感性 胸腺嘧啶 低能氮离子 溅射 

分 类 号：Q691[生物学—生物物理学]