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机构地区:[1]哈尔滨工业大学应用化学系,哈尔滨150001
出 处:《电镀与涂饰》2005年第3期1-4,共4页Electroplating & Finishing
摘 要: 电沉积制备的银纳米膜的X 射线光电子能谱测试表明,纳米膜中的银显示出银元素的特征峰;采用四探针测试仪测量银纳米膜的电导率,发现银纳米膜的电导率比纯银要下降两个数量级;X射线衍射分析发现,银纳米膜的衍射峰相对于纯银发生了宽化,计算得出平均颗粒大小为50nm;紫外-可见分光光度计测量了纳米膜的吸光度,其吸收峰发生"蓝移";银纳米膜的熔点也会变低;用椭圆偏振仪测试不同波长下的复折射率和复介电常数及纳米膜的厚度;用Z 扫描装置测量出银纳米膜具有非线性折射性质,并计算了非线性折射系数n2达2 34×10-11esu。Silver nanofilm prepared by electrodepositon was examined by X-ray photo-electron spectrometer which showed a peak of silver element. Electric conductivity of silver nanofilm was two orders of magnitude lower than that of pure silver by four-pin probe instrument; the diffractive peak of silver nanofilm was broadened compared with that of pure silver with method of X-ray diffractive analysis. The average size of particle was calculated to be 50 nm. The absorbency of nanofilm was determined by UV-visible spectrophotometer in which absorption peak was shifted to blueside. The melting point of silver nanofilm became lower. The complex index of refraction, complex dielectric constant and thickness of nanofilm at different wavelength were all measured by ellipsometer. Silver nanofilm performed non-linear refrangibility in Z-scanning and its coefficient of non-linear refrangibility (n^2) was calculated to be 2.34×10^(-11) esu.
分 类 号:TQ153.16[化学工程—电化学工业] O484[理学—固体物理]
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