金属离子缓冲溶液电位法的原理和应用──Ⅰ．络合物稳定常数的测定  

DETERMINATION OF COMPLEX STABILITY CONSTANT BY METAL ION BUFFER SOLUTION POTANTIOMETRY Ⅰ. Determination of Complex Stability Constants

作　　者：王洪英[1] 陈志斌[1] 方国春[1] 

机构地区：[1]武汉大学化学系

出　　处：《武汉大学学报（自然科学版）》1994年第4期79-84,共6页Journal of Wuhan University(Natural Science Edition)

摘　　要：详细地讨论了金属离子缓冲溶液测定络合物稳定常数的原理和应用．用铜离子选择电极电位法测定了铜的络合物稳定常数，效果满意．Metal ion buffer solution has been discussed and used in determination of complex stability constants in detail. In experiment,copper ion-selective eletrode was used and the complex stability constants of copper ion with glycine,PAN,β-aline,H3cit and dipyridine were determined. The results are satisfied.

关 键 词：铜电极 金属离子 缓冲溶液 电位法 

分 类 号：O657.15[理学—分析化学]