电沉积坡莫合金薄膜的结构和纵向磁阻抗效应(英文)  

Structure and Longitudinal Magnetoimpedance Effect of Permalloy Films by Electrodeposition

作　　者：宫峰飞[1] 凯木尔[1] 沈国土[1] 袁望治[1] 阮建中[1] 杨燮龙[1] 

机构地区：[1]华东师范大学物理系,上海200062

出　　处：《华东师范大学学报（自然科学版）》2005年第1期63-67,共5页Journal of East China Normal University(Natural Science)

基　　金：上海市启明星项目(98QE14029)

摘　　要：采用电沉积法制备了厚度为1.1μm到6.9μm的坡莫合金薄膜.经X-射线衍射分析.其结构为fcc 结构,其中NiFe(111)衍射峰的强度明显增强.该薄膜的磁滞回线测量结果表明:其矫顽力随着薄膜厚度的增加而减小.在交流I(?)=6 mA,频率范围在0.05 kHz到600 kHz的条件下,纵向磁阻抗比随着薄膜厚度的增加而增加,其最小值可达-52%.The structure of electrodeposited permalloy films with thickness from 1. 1μm to 6. 9μm is determined to be fcc structure by using X-ray diffraction, which the intensity of NiFe(111) peak increases significantly. Magnetic hysteresis loops of the films demonstrate the decrease of their coercivity values with the increase of the film thickness. Longitudinal magnetoimpedance ratio is measured with an alternating current of I(?) = 6 mA and frequency from 0. 05 kHz to 600 kHz. The minimum value of longitudinal magnetoimpedance ratio is down to -52%.

关 键 词：结构 磁阻抗 坡莫合金 电沉积 

分 类 号：TM271.2[一般工业技术—材料科学与工程]