基体温度和氮分压对（Ti，Al）N涂层性能的影响  

Effect of Substrate Temperature and Nitrogen Flow Rate on (Ti, Al) N Coating Properties

作　　者：王永康 程祥宇 王伟民 顾晓红.李炳生 

机构地区：[1]五二研究所宁波分所

出　　处：《稀有金属材料与工程》1994年第3期55-58,共4页Rare Metal Materials and Engineering

摘　　要：运用ＰＶＤ工艺在Ｍ２高速钢表面沉积了（ＴｉＡｌ）Ｎ涂层，用ＳＥＭ、ＴＥＭ和ＸＲＤ方法对涂层显微组织和结构进行了分析研究，并对涂层的性能进行测试。结果表明，涂层的显微硬度和耐磨性随涂镀时基体温度上升而提高，在ＴＳ＝４８０℃时涂镀效果较佳；也随涂镀时的氮流量有关系，当Ｎｆ＝１２ｍｌ．ｍｉｎ－１时，Ｈｖ可达２４００。i,Al)N coating was deposited on M2 high speed steel by method of physicl vapor deposition.The microstructure of the coating was analized by method of SEM,TEM and XRD.The coating microhardness and wear-resistant properties increases with the substrate temperature(Ts) and have optimum values as Ts=480℃ .They also have close relationship with the change of nitrogen flow rate in a certain range.Hv can reach up to 2400 as Nf=12ml.min-1

关 键 词：PVD 涂层 硬度 耐磨性 氮化物 

分 类 号：TG178[金属学及工艺—金属表面处理]