射频磁控共溅射制备光催化Ag-TiO_2薄膜  

Photocatalytic Ag-TiO_2 Thin Films Prepared by RF Magnetron Co-Sputtering

作　　者：沈杰[1] 蔡臻炜[1] 沃松涛[1] 崔晓莉[1] 任达森[1] 杨锡良[1] 章壮健[1] 

机构地区：[1]复旦大学材料科学系,上海200433

出　　处：《真空科学与技术学报》2005年第1期33-36,共4页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金 (2 0 0 73 0 11和 2 0 2 73 0 18);上海市分子催化和功能材料重点实验室资助项目

摘　　要：采用射频磁控共溅射法制备Ag TiO2 复合薄膜 ,通过控制Ag靶的溅射时间可调节Ag与TiO2 的比例。所制备的Ag TiO2 薄膜为锐钛矿结构。通过紫外光照降解亚甲基蓝溶液和循环伏安法研究Ag TiO2 薄膜光催化及光电化学特性。实验结果表明 :掺 1.5 %Ag的Ag TiO2 薄膜在紫外光照射下能增强亚甲基蓝溶液的降解并得到更大的光生电流。这种光催化的增强主要是由于光生电子 空穴对的复合被抑制的结果。Ag-TiO2 thin films were prepared by RF magnetron co-sputtering. The ratio of Ag to TiO2 can be adjusted by controlling sputtering time of Ag. The Ag-TiO2 thin films were found to have an anatase phase. Photocatalytic degradation of methylene blue (MB) dye in aqueous solutions by Ag-TiO2 thin films was performed under UV irradiation. Electrochemical characteristics of Ag-TiO2/ITO electrode under UV irradiation was studied with cyclic voltammetry. Experimental results show that an optimal Ag content of 1.5% enhanced the MB photodegradation and the photo-induced current. The enhancement of photocatalytic activity results from suppressing the excited electron-hole pair recombination.

关 键 词：TIO2薄膜 光催化 共溅射法 亚甲基蓝 循环伏安法 光电化学 锐钛矿结构 射频 增强 电子 

分 类 号：TB383[一般工业技术—材料科学与工程] TN304.055[电子电信—物理电子学]