电子束蒸镀制备的Mg-Zr-O复合介质保护膜结晶取向的研究  

Preferred Crystal Orientation of Mg-Zr-O Composite Protective Layer Prepared by E-beam Evaporation

作　　者：郭滨刚[1] 刘纯亮[1] 刘柳[1] 范玉峰[1] 夏星[1] 

机构地区：[1]西安交通大学电子物理与器件教育部重点实验室,西安710049

出　　处：《真空科学与技术学报》2005年第1期53-56,共4页Chinese Journal of Vacuum Science and Technology

基　　金：教育部科学技术研究重大项目"彩色PDP介质保护膜的制备与工艺优化"(No .0 2 0 5 )资助

摘　　要：采用电子束蒸发制备Mg Zr O复合介质保护膜 ,使用X射线衍射测试Mg Zr O复合介质保护膜的结晶择优取向 ,研究了ZrO2 掺杂及工艺参数对Mg Zr O复合介质保护膜结晶取向的影响。结果表明 ,ZrO2 掺杂会使Mg Zr O复合介质保护膜产生晶格畸变 ,并改变其结晶取向。当ZrO2 掺杂比为 0和 0 .10时 ,晶格畸变较小 ,容易获得 (111)结晶取向 ;当ZrO2 掺杂比为0 .0 5和 0 .2 0时 ,晶格畸变较大 ,容易获得 (2 2 0 )或 (2 0 0 )结晶取向。蒸镀工艺对 (111)、(2 0 0 )和 (2 2 0 )取向的影响不尽相同 :较高的蒸镀速率有利于获得较强的 (111)、(2 0 0 )和 (2 2 0 )衍射峰 ;较低的基板温度有利于获得 (111)和 (2 2 0 )结晶取向 ,而较高的基板温度则有利于获得 (2 0 0 )结晶取向。Mg-Zr-O composite protective film was grown on glass substrate of an AC plasma display panel (AC-PDP) by electron beam deposition of MgO powders mixed with different contents of ZrO2. The structure of the film was then characterized with X-ray diffraction (XRD). The results show that addition of ZrO2 significantly affects the grain orientation and lattice distortion of the film. When the ZrO2 contents by weight account for 0.00 and 0.10 of the mixed powders, small lattice distortion and preferred growth orientation were observed, whereas the contents of ZrO2 increase to 0.05 and 0.20, fairly large lattice distortion was found and the grains easily grow preferably in and orientations. Moreover, strong (200) and (220) diffraction peaks result from higher deposition rates. The preferred orientations of low substrate temperature are and while it becomes direction for higher substrate temperatures.

关 键 词：结晶取向 蒸镀 复合介质 掺杂 ZRO2 晶格畸变 衍射 保护膜 基板 电子束 

分 类 号：TB333[一般工业技术—材料科学与工程] O484.1[理学—固体物理]