脉冲高能量密度等离子体沉积(Ti,Al)N薄膜组织及其性能研究  

Study on the microstructure and properties of (Ti, Al)N film deposited by pulsed high energy density plasma

作　　者：刘元富[1] 韩建民[1] 张谷令[2] 王久丽[2] 陈光良[2] 李雪明[3] 冯文然[2] 范松华[2] 刘赤子[2] 杨思泽[2] 

机构地区：[1]北京交通大学机械与电子控制工程学院,北京100044 [2]中国科学院物理研究所,北京100080 [3]北京科技大学材料科学与工程学院,北京100083

出　　处：《物理学报》2005年第3期1301-1305,共5页Acta Physica Sinica

基　　金：国家高技术研究发展计划 (批准号 :2 0 0 2A3 3 10 2 0 );国家自然科学基金 (批准号 :5 0 0 710 68; 10 2 75 0 88)资助的课题 .~~

摘　　要：利用脉冲高能量密度等离子体技术在室温条件下在 4 5 #钢基材表面沉积了高硬度耐腐蚀 (Ti,Al)N薄膜 .利用扫描电子显微镜、X射线衍射、X射线光电子能谱、俄歇电子能谱分析了薄膜的显微组织 .利用纳米压痕仪测试了薄膜的纳米硬度 .测试了薄膜在 0 5mol LH2 SO4 水溶液中的耐蚀性 .测试结果表明 :薄膜主要组成相为 (Ti,Al)N ,同时含有少量的AlN ,薄膜的纳米硬度高达 2 6GPa ,薄膜具有良好的耐蚀性 ,与 1Cr18Ni9Ti奥氏体不锈钢相比 ,耐蚀性提高了一个数量级 .Hard and corrosion resistance (Ti, Al) N film was deposited by pulsed high energy density plasma on the substrate of 0.45% C carbon steel at ambient temperature. The microstructure of the film has been investigated by SEM, XRD, XPS and AES. The nanohardness of the film was tested by nanoindentation tester. The corrosion resistance of the film was tested by potentiodynamic polarization in 0.5 mol /L H2SO4, aqueous solution. The results indicate that the film mainly composed of (Ti, ON and a small amount of Al)N. The nanohardness of the film approaches 26 GPa. The corrosion resistance of the film is improved by about one order of magnitude, compared with 1Cr18Ni9Ti austenitic stainless steel.

关 键 词：(TI AL)N 脉冲高能量密度等离子体 耐蚀性 1CR18NI9TI 奥氏体不锈钢 俄歇电子能谱 显微组织 薄膜 个数 室温条件 

分 类 号：TB43[一般工业技术]