SiC颗粒的表面修饰及结构表征  

Surface Decoration and Characterizations on Silicon Carbide Particles Based on Electroless Plating

作　　者：宿辉 曹茂盛 王正平 邹桂真[2] 

机构地区：[1]哈尔滨工程大学材料科学与工程系 [2]北京理工大学材料科学与工程学院

出　　处：《材料工程》2005年第2期37-40,共4页Journal of Materials Engineering

基　　金：科技部 86 3专项课题 (2 0 0 2 AA3 0 550 9)

摘　　要：利用简单的化学镀方法,实现了SiC颗粒的表面化学修饰。通过对酸性、碱性修饰液的比较研究,证实在相同条件下,碱性镀液的修饰效果较好;采用SEM,TEM,EDS和XRD,对修饰前、后的SiC颗粒的物相、晶形、成分等进行了研究,初步表征了Ni/SiC颗粒复合粒子的微结构;并考察了热处理对修饰后SiC颗粒的影响。The surface of silicon carbide particles was decorated by electroless plating. It has been proved that the plating in basic bath has better decorating silicon carbide than that of plating in acidic bath under the same condition. The surface of silicon carbide particles before and after decoration, including phase, crystalline, nickel and its compounds, and feature of decorated coating, is investigated. The microstructures of Ni/SiCP is characterized preliminarily by means of SEM, TEM, EDS and XRD. In addition, the heat treatment effect on silicon carbide particles after decoration is studied.

关 键 词：碱性镀液 化学镀 晶形 结构表征 表面修饰 物相 复合粒子 SIC颗粒 表面化学修饰 XRD 

分 类 号：TB331[一般工业技术—材料科学与工程] TB383