聚对二甲苯/SiO_2复合薄膜的制备及光学性能研究  

Study on preparation and optical properties of Poly(p-xylylene)/SiO_2 composite film

作　　者：刘枫[1] 沈军[1] 秦仁喜[1] 吴广明[1] 周斌[1] 肖轶群[1] 吴兆丰[1] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092

出　　处：《功能材料与器件学报》2005年第1期38-42,共5页Journal of Functional Materials and Devices

基　　金：国家自然科学基金重点项目(20133040)资助课题;国家高技术863计划项目(2002AA842052)资助课题

摘　　要：聚对二甲苯是一种可应用于光学器件和晶体保护的新型高分子材料。采用真空化学气相沉积法制备聚对二甲苯薄膜,并通过提拉镀膜法在其表面镀制一层SiO2增透膜,可提高薄膜的透射率至90%以上。用FT-IR、紫外-近红外分光光度计和XPS对聚对二甲苯/SiO2复合薄膜结构和光学性能进行了表征和测试,并初步研究了薄膜受紫外光辐照而产生光氧化现象的机理。Poly (p-xylylene) is a novel material applied in protection of optical components and crystals. Poly (p-xylylene) film was prepared by vacuum Chemical Vapor Deposition process. It is shown that the transmittance of film can be raised to more than 90% by SiO2 anti-reflective coating on its surface. FTIR, UV-visible spectra and XPS were used to characterize the structure and optical property of films. The mechanism of photooxidation of Poly (p-xylylene) film is also prelimiary analyzed.

关 键 词：聚对二甲苯 SiO2增透膜 光氧化 

分 类 号：O484[理学—固体物理]