N^+离子注入对锆-4合金耐腐蚀性能的影响  

Effect of N^+ ion implantation on corrosion resistance of zicaloy-4

作　　者：万千[1] 白新德[2] 刘晓阳[1] 

机构地区：[1]清华大学工程物理系,北京100084 [2]清华大学材料科学与工程系,北京100084

出　　处：《核技术》2005年第4期289-291,共3页Nuclear Techniques

摘　　要：为了研究N+离子注入对锆-4合金耐腐蚀性能的影响,本文使用直线加速器产生的N+离子注入锆-4合金样品,通过对离子注入后样品电化学曲线的测量,分析不同剂量下N+离子注入对锆-4合金钝化电流密度的影响,同时使用透射电子显微镜分析注入层的微观结构。结果表明,随着注入剂量的提高(0—1×1016cm-2),样品钝化电流密度下降,耐腐蚀性能提高,其原因主要归结于样品表层由多晶结构到非晶结构的转变过程。In order to investigate effect of ion implantation on corrosion resistance of zircaloy-4, N+ ions from an accelerator at doses ranging from 4 ×1014 to 1 × 1016 cm-2 were employed. Effect of N+ ion implantation on passive current density was studied by electrodynamic polarization measurements in a 0.5 mol/L F2So4 solution at room temperature, and Transmission Electron Microscopy (TEM) was used to examine the change of microstructures in the implantated surface. The potentiodynamic tests showed that with the increase of implanted dose, surface passive current density decreased remarkably. The enhancement of corrosion resistance can be attributed to the amorphous phase formation in the implanted surface.

关 键 词：锆-4合金 N^+离子注入 耐腐蚀性能 

分 类 号：TG146.4[一般工业技术—材料科学与工程]