微柱分离-ICP-MS测定高纯氧化钐中稀土杂质  

Micro-Column Separation-ICP-MS Determination of REE Impurities in High-Purity Sm_2O_3

作　　者：李继东[1] 伍星[1] 郑永章[1] 

机构地区：[1]北京有色金属研究总院分析测试中心,北京100088

出　　处：《中国稀土学报》2005年第1期109-112,共4页Journal of the Chinese Society of Rare Earths

基　　金：科技部 科技基础性工作专项资助课题(基2001 16)

摘　　要：研究了微柱分离 ICP MS测定高纯氧化钐中痕量Dy,Ho,Er,Tm的方法,方法基于采用Cyanex272负载树脂微柱,选定上述杂质与大量基体分离的实验条件,分离周期为32min。最终建立了微柱分离Sm后测定Dy,Ho,Er,Tm,其他稀土杂质用内标补偿ICP MS法直接测定的分析方法。方法测定下限为0.1～5.0μg·g-1,加标回收率为90%～115%,相对标准偏差为0.9%～5.1%。本法可满足快速测定99.999%氧化钐中14个稀土杂质的要求。A method of micro-column separation-ICP-MS determination of trace Dy, Ho, Er, Tm in high purity Sm_2O_3 was studied. By adopting Cyanex 272 loaded resin column and optimizing separation conditions for separating Sm matrix, the separation period was only 32 min. Combined with direct ICP-MS determination of other REE impurities using internal standard method, 14 REE impurities in high purity Sm_2O_3 were determined. The determination limits for REE are 0.1～5.0 μg·g^(-1), the precisions of measurement are 0.9%～5.1% RSD and the recoveries of standard addition were 90%～115%. The method is rapid and easy to operate. It has been applied to the determination of REE impurities in high purity Sm_2O_3 with purity of 99.999%.

关 键 词：微柱分离 ICP—MS 高纯氧化钐 杂质 稀土 

分 类 号：O614.3[理学—无机化学] O65[理学—化学]