用新型双对靶溅射仪制备的Fe/Ti多层膜的结构特征  

STRUCTURAL PROPERTIES OF Fe/Ti MULTILAYERS PREPARED BY DUAL-FACING-TARGET SPUTTERING

作　　者：刘明升[1] 姜恩永[1] 刘裕光[1] 王忠杰[2] 

机构地区：[1]天津大学应用物理系薄膜研究室,天津300072 [2]神户大学理学部

出　　处：《真空科学与技术》1994年第6期440-445,共6页Vacuum Science and Technology

摘　　要：在原FTS-Ⅰ型对向靶溅射基础上，设计制作了DFTS－Ⅱ型双对靶溅射仪，它具有低温、高速、成分偏离小和连续均匀溅射的特性，能够同时或交替溅射不同材料。使用DFTS－Ⅱ制备的Fe／Ti多层膜具有良好的周期调制结构，层内结构是以Fe（110）bcc相为主的Febcc多晶和Ti（0002）hcp取向生长的，但在Fe／Ti多层膜Fe／Ti的界面存在扩散驰豫现象。Magnetron dual-facing-target sputtering (DFTS-Ⅱ) system,which was designed on the basic principle of the facing-target sputtering (FTS),has the advantage of sputtering continuously and homogeneously at low substrate temperature with high productivity as well as less composition difference. In addition, it can sputter with different materials simultaneously or alternatively. The Fe/Ti multilayered films (MLF) prepared by DFTS have good quality of medulated periedicity. The structure of their innerlayers is of Ti (0002) hcp and Fe bcc polycrystalline [mainly of α-Fe(110)]. Meanwhile,there exists interdiffusion of Fe,Ti atoms at Fe-Ti interface in Fe/Ti MLF.

关 键 词：双对靶溅射仪 溅射仪 磁性多层膜 调制结构 

分 类 号：TB43[一般工业技术] O484.43[理学—固体物理]