交联蒙脱土催化剂底面间距的测定  

Determination of the Layer Distance of Multi-metal Complex Cross-linked Montmorillonite

作　　者：周华锋[1] 何美[1] 王雅静[1] 聂英龙[1] 

机构地区：[1]沈阳化工学院应用化学系,辽宁沈阳110000

出　　处：《辽宁化工》2005年第4期179-182,共4页Liaoning Chemical Industry

摘　　要：通过X射线衍射测定了一系列羟基混合金属柱交联蒙脱土的底面间距,并考察了制备条件、焙烧温度等对交联蒙脱土底面间距的影响。结果发现蒙脱土经交联之后底面间距有较大的增加;采用共混法、焙烧温度在5 0 0℃时制得的催化剂具有较大的底面间距;另外,羟基混合金属柱中各种金属离子的比例对交联蒙脱土的底面间距有较大的影响。The layer distance of a series of CLM( cross-linked montmorillonite) w as determined by XRD. The effects of preparation condition, calcination temperat u re on the layer distance of CLM have been studied. The results showed that the o pt imum preparation method was copolymerization; the optimum calcination temperatu re was 500 ℃. Moreover, the ratio of the metals had great effect on the layer d istan ce of CLM.

关 键 词：交联 蒙脱土 底面间距 

分 类 号：O643.36[理学—物理化学]