神光装置φ200mm口径KDP晶体高功率倍频激光系统  

φ200 mm Large Aperture KDP Crystal High Power Frequency Doubling Laser System

作　　者：蔡希洁 茅建华[1] 陈万年[1] 沈丽清 刘凤翘[1] 谈育民[1] 王世绩[1] 

机构地区：[1]中国科学院上海光机所高功率激光物理联合实验室

出　　处：《中国激光》1994年第11期853-859,共7页Chinese Journal of Lasers

基　　金：国家高技术激光领域基金

摘　　要：报道了φ２００ｍｍ口径ＫＤＰ晶体高功率倍频激光系统的研制结果，并实现了神光装置信频激光打靶。五十枪次全口径打靶实验表明，倍频激光系统性能稳定。实验中，当入射基频激光强度大于１．５ＧＷ／ｃｍ２，倍频器的外部转换效率保持在６０％以上。最大入射基频激光能量为３５７．８Ｊ时，输出倍频激光能量为２２３．４Ｊ，倍频转换效率为６５．６％。?00 mm large aperture KDP crystal high power frequency doubling laser system for LF12 TW facility has been developed firstly.In the experiment of using doubling laser beam to target,the external frequency doubling conversion efficieny was kept over 60%when incident laser intensity was higher than 1.5 GW/cm2.Its highest efficiency of up to 65.6% was obtained.The largest output energy is 223.4J(0.527μm) with the largest input energy 357.8 J(1.054μm).

关 键 词：倍频激光系统 KDP晶体 高功率 神光装置 

分 类 号：TN249[电子电信—物理电子学]