TiAlCrFeSiBN多元膜的性能与组织结构研究  

Study on Performance and Microstructure of TiAlCrFeSiBN Films

作　　者：谢致薇[1] 王国庆[1] 杨元政[1] 匡同春[1] 白晓军[1] 谢光荣[1] 胡社军[1] 

机构地区：[1]广东工业大学,广东广州510643

出　　处：《稀有金属材料与工程》2005年第4期648-652,共5页Rare Metal Materials and Engineering

基　　金：广东省教育厅重点扶持学科项目(980012)

摘　　要：采用电弧离子镀技术、TC7双相钛合金靶沉积TiAlCrFeSiBN薄膜,研究了这种多元膜的显微硬度、高温氧化性能和组织结构。结果表明:这种多元膜具有优于TiN膜的显微硬度;具有不同于TiN膜的显微组织,其最显著的特征是存在较多细小的钛滴,这些钛滴与膜之间的融合效果很好;膜层上孔隙较少;具有TiN的面心立方结构,与TiN膜相比,具有更加明显的择优取向趋势。TiAlCrFeSiBN films have been deposited by cathode arc ion-plating with TC7 (α+β double phases) titanium alloy target. The performance and microstructure have been studied. The results show that the microhardness of the multi-component films is higher than that of TiN films. The films have excellent high temperature oxidation performance. The microstructure of the multi- component films is quite different from that of TiN films. The microstructure of the multi-component films is characteristic of many titanium droplets combined with the films substrate, and a few pores. It is found that the preferred orientation exists in the films.

关 键 词：电弧离子镀 多元膜 显微硬度 高温氧化性能 

分 类 号：TB383[一般工业技术—材料科学与工程]