TiO_2催化剂薄膜背光催化的研究  

Background Irradiated Photocatalysis of TiO_2 Thin Films

作　　者：岑继文[1] 李新军[1] 梁园园[1] 何明兴[1] 郑少健[1] 冯满枝[1] 

机构地区：[1]中国科学院广州能源研究所

出　　处：《环境科学》2005年第3期135-140,共6页Environmental Science

基　　金：广东省自然科学重点基金资助项目 (0 10 873 ;3 2 70 8)

摘　　要：利用TiO2 催化剂薄膜进行光催化反应时,根据光照方式的不同可分为正光催化和背光催化.两者相比,背光催化可以避免光在溶液中的衰减而造成的光能损失.本文研究了背光催化时薄膜的厚度,光源波长的选择,及其非均掺杂V对催化效率的影响,同时与正光催化的情况作了比较.结果表明:与正光催化明显不同,背光催化时催化剂薄膜厚度对应于光源波长有一个最佳值,光源波长也只能选择大约在30 0～388nm之间;非均匀掺杂情况与正光催化相同,能提高薄膜的催化效率.In terms of the UV irradiating directions, photocatalysis with TiO_2 thin films can be divided into two types, the background irradiated photocatalysis and the foreground irradiated one. Comparatively, background irradiated photocatalysis has an advantage of avoiding the UV light attenuation which foreground irradiated one suffers when the light is going through the solution. In this article, the influence of the thickness of the films, the wavelength of light source and non-uninformly doping with V on the photocatalytic efficiency of the catalyst in case of background irradiated photocatalysis is investigated, and simultaneously it is compared with foreground irradiated one. The results show that in case of background irradiated photocatalysis there is an optimal thickness of the film according to the wavelength of the light source that is limited in the range of 300nm to 388nm, which is quite different from foreground irradiated one. But in both cases, the catalyst's photocatalytic activities are improved by non-uniformly doped with V.

关 键 词：光催化 背光催化 二氧化钛 薄膜厚度 

分 类 号：O647[理学—物理化学] X703.1[理学—化学]