静电自组装法制备SiO_2光学增透膜  

Preparation of SiO_2 Optical Anti-reflective Thin Film by Electrostatic Self-Assembly Multi-layer Process

作　　者：何方方[1] 许丕池[1] 卢忠远[1] 滕元成[1] 廖其龙[1] 

机构地区：[1]西南科技大学四川省先进建筑材料重点实验室,四川绵阳621002

出　　处：《四川大学学报（工程科学版）》2005年第3期90-93,共4页Journal of Sichuan University (Engineering Science Edition)

基　　金：国防基础科学研究资助项目(K12030611091);西南科技大学引进人才科研启动基金资助项目(ZK043073)

摘　　要：为了进一步提高低折射率光学器件的可见光透过率,用静电自组装(ESAM)法在玻璃基片(折射率1.45)表面组装了多孔SiO2增透膜。以NH3·H2O催化和HCl与NH3·H2O分步催化分别制备了胶粒带负电荷的SiO2溶胶。用带正电荷的聚电解质聚二烯丙基二甲基氯化铵(PDDA)溶液与SiO2溶胶组装了PDDA/SiO2复合薄膜。然后进行热处理,制备了多孔SiO2薄膜。结果显示,经520℃热处理后,两种薄膜可见光峰值透过率增加,峰值波长由560nm向短波移到520nm,耐机械擦伤强度增大。NH3·H2O催化制备的薄膜透过率相对较高,峰值由98.2%达到99.2%,但耐刮伤能力相对较差。In order to enhance the visible light transmittance of optical devices such as vitreous lens possessing low refractive index, porous SiO2 optical anti-reflective films were prepared by Electrostatic Self-Assembly Multilayer (ESAM) process. Firstly SiO2 Sols were obtained by NH3&middotH2O catalysis, or by HCl and NH3&middotH2O catalysis in succession. Then the PDDA/SiO2 films were assembled on K9 glass substrates using Poly-diallyldimethylammonium chloride (PDDA) and SiO2 Sols, and the porous SiO2 film was prepared by heat treatment. The results showed that the values of the highest transmittance increased after heat-treatment and their wavelength positions moved from 560 nm to 520 nm in two kinds of films. The SiO2 sol catalyzed by NH3&middotH2O had the peak value increasing from 98% to 99.2%. The mechanical strength of films were very strong.

关 键 词：静电自组装 SIO2 光学增透膜 热处理 

分 类 号：TB443[一般工业技术]