氧化物熔盐电沉积二硼化钛镀层的研究  

Electrodeposition of Titanium Diboride Coating from Molten Salts Containing Oxide Electrolyte

作　　者：江卢山[1] 李冰[1] 李军[1] 

机构地区：[1]华东理工大学材料科学与工程学院,上海200237

出　　处：《稀有金属》2005年第2期162-166,共5页Chinese Journal of Rare Metals

基　　金：国家自然科学基金资助项目 (5 0 2 0 40 0 6)

摘　　要：分别采用脉冲电源和直流电源,利用TiO2 B2 O3 LiF KF熔盐体系,在石墨基体上电沉积制备了TiB2 镀层。在实验中,考察了直流电流密度、脉冲宽度、脉冲间隔、脉冲电流幅度等条件对TiB2 镀层性能的影响。实验结果表明:采用脉冲电沉积得到的镀层性能优于直流电沉积。在本实验参数下(摩尔比TiO2 ∶B2 O3∶KF∶LiF =0 .0 6∶0 .4∶0 .74∶0 .8,温度80 0℃,脉冲宽度7.5ms ,脉冲间隔2 .5ms,电流密度0 .6A·cm- 2 ,电沉积时间5 0min)得到的TiB2 镀层表面平整,有金属光泽,结构致密,晶粒细小,与基体的结合力良好。Electrodeposition of TiB_2 coatings on graphite substrate from molten salts system containing TiO_2-B_2O_3-LiF-KF by CCP(continuous current plating) and PCP(pulsed current plating) was studied. In the experiments, the effects of some conditions such as current density of CCP, pulse width, pulse intervals, pulse current average were examined. The results show that the coatings prepared by PCP have better comprehensive properties than that by CCP. Under the following conditions of PCP(molar ratio TiO_2∶B_2O_3∶KF∶LiF=0.06∶0.4∶0.74∶0.8, 800 ℃, pulsed width 7.5 ms, pulsed interval 2.5 ms, current density 0.6 A·cm -2 , depositing time 50 min) the coatings are uniform, compact and have good adhesion to graphite substrate. The coatings have metallic brightness, and the crystal grains of coatings are relatively fine.

关 键 词：氧化物 二硼化钛 电沉积 脉冲 

分 类 号：TG146.4[一般工业技术—材料科学与工程]