射频磁控溅射法制备BST薄膜及性能研究  

Properties and Preparation of Barium Strontium Titanate Thin Films by RF-Magnetron Sputtering

作　　者：陈宏伟[1] 杨传仁[1] 符春林[1] 裴亚芳[1] 胡立业[1] 

机构地区：[1]电子科技大学微电子与固体电子学院,四川成都610054

出　　处：《压电与声光》2005年第3期297-299,302,共4页Piezoelectrics & Acoustooptics

基　　金：国家"九七三"基金资助项目(Z01)

摘　　要：采用射频磁控溅射法制备了钛酸锶钡薄膜材料,研究了薄膜的晶体结构和微观形貌,测试了其偏压特性曲线和电滞回线。初步探讨了εr-E曲线、电滞回线发生平移的原因:上下电极与钛酸锶钡薄膜间的界面势垒不对称。Barium strontium titanate (BST) thin films were prepared by RF magnetron sputtering. The microstructure and surface morphology were investigated. The dielectric constant-electric field curve and polarization hysteresis loops of BST thin films have been measured. The ε_r-E and P-V curves show a voltage shift toward the negative side and asymmetry, which may be caused by asymmetric potential barriers at the upper and bottom interfaces.

关 键 词：射频磁控溅射 钛酸锶钡 铁电薄膜 εr-E曲线 电滞回线 

分 类 号：TN384[电子电信—物理电子学]