KZ-400离子束刻蚀装置设计中的若干真空问题  

Seme problems of vacuum system for KZ-400 RF ion beam etching system

作　　者：高飞[1] 董晓浩[1] 赵飞云[1] 凤良杰[1] 徐朝银[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《真空》2005年第3期45-48,共4页Vacuum

基　　金：国家863项目;编号:2003AA849020

摘　　要：本文解决了KZ-400离子束刻蚀装置设计中遇到的若干真空问题。通过抽速计算选择了合理的真空配置;用有限元分析软件ANSYS计算了真空室的受压形变,优化了真空室的结构,采取了合理的误差补偿措施;并通过摩擦润滑试验和质谱分析检测了二硫化钼润滑剂的真空润滑性能,解决了工作台扫描运动的有效润滑。Some problems of vacuum system for KZ-400 ion beam etching system were put forward and solved. Reasonable configuration of vacuum system were chosen and ANSYS was used to analyze and calculate the deformations of the vacuum chamber in different structures, based on which the structure was optimized with reasonable compensation measures taken. Experiments and mass spectrum analysis were made to test the performance in vacuum of a MoS 2 lubricant so as to lubricate (efficiently) the scanning movement for working table.

关 键 词：真空配置 有限元分析 润滑剂 质谱分析 

分 类 号：TB753[一般工业技术—真空技术] TH122[机械工程—机械设计及理论]