高功率激光冲击处理装置及其驱动冲击波实验研究  

Research of properties of the shock wave induced by high power laser and laser shock processing equipment

作　　者：吴边[1] 王声波[2] 朱灵[1] 郭大浩[2] 吴鸿兴[2] 

机构地区：[1]中国科学院安徽光学精密机械研究所,合肥230031 [2]中国科学技术大学强激光技术研究所,合肥230026

出　　处：《应用激光》2005年第2期103-105,116,共4页Applied Laser

摘　　要：对实验研制的高功率、短脉冲强激光冲击处理装置进行了输出特性研究,其输出能量不稳定度和激光脉冲功率不稳定度分别为±3.8%和±6.5%。采用透镜列阵的焦斑均匀化系统使光强分布起伏度达到±12%。并利用新型压电传感器(PVDF压电传感器)对其引发的激光冲击波压力进行了实时测量。We research the output properties of high po wer, short pulse strong laser shock processing equipment, the output unstable de gree of energy and the output unstable degree of laser pulse power is respective ly ±3.8% and ±6.5%. we adopt focal spot uniformization system of lens array an d make the risen and fallen degree of light intensity only to ±12%. We utilize new type piezoelectricity gauge ( PVDF piezoelectricity gauge) to carry on real- time measurement to laser-induced shock wave pressure.

关 键 词：处理装置 激光冲击 高功率 实验研究 压电传感器 驱动 不稳定度 冲击波压力 脉冲功率 输出能量 特性研究 光强分布 透镜列阵 实时测量 短脉冲 均匀化 焦斑 

分 类 号：TN249[电子电信—物理电子学] X703[环境科学与工程—环境工程]