16×0.8nm Si基SiO_2阵列波导光栅设计、制备及测试  

Silica based 16×0.8nm arrayed waveguide grating multiplexer design, fabrication and testing

作　　者：李健[1] 安俊明[1] 王红杰[1] 胡雄伟[1] 

机构地区：[1]中国科学院半导体研究所,北京100083

出　　处：《光学技术》2005年第3期349-350,353,共3页Optical Technique

基　　金：国家重点基础研究发展规划(G2000036602);国家自然科学基金(69889701)资助项目

摘　　要：叙述了一个完整的16通道硅基二氧化硅阵列波导光栅(AWG)的设计、制备及测试过程。通道间隔为0.8nm(100GHz),解复用器的插入损耗为16.8dB,其中材料损耗为11.95dB,相邻通道串扰小于-17dB,通道插损非均匀性小于2.2dB。A 16 × 0.8 nm silica based arrayed waveguide grating multiplexer operating around 1550 nm was designed and fabricated. The testing result shows that the channel spacing is 0.8 nm (100 GHz), the insertion loss of the multiplexer is 16.8 dB, including the material absorb loss which is 11.95 dB, the cross talk of the neighboring output port is less than -17 dB and the uniformity of the insertion loss is less than 2.2 dB.

关 键 词：光波导 波分复用/解复用器 阵列波导光栅 

分 类 号：TN253[电子电信—物理电子学]