表面处理对蓝宝石衬底的影响  

Influence of Surface Treatment on the Sapphire Substrate

作　　者：王银珍[1] 彭观良[1] 刘世良[1] 李抒智[1] 邹军[1] 周圣明[1] 徐军[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800

出　　处：《人工晶体学报》2005年第3期431-434,共4页Journal of Synthetic Crystals

摘　　要：蓝宝石衬底是目前最为普遍的一种衬底材料,是生长GaN、ZnO材料最常用的衬底。本文用光学显微镜、原子力显微镜(AFM)和高分辨X射线双晶洐射对蓝宝石衬底进行了分析测试,系统研究了经过机械抛光、化学机械抛光、化学腐蚀等表面处理对蓝宝石衬底表面性能的影响。结果表明经过化学机械抛光随后再经腐蚀后的蓝宝石衬底的表面性能最好。Sapphire is known as the most commonly used substrate, and is widely used as the substrate for the growth of GaN and ZnO. The substrates were investigated by means of polarizing microscope, AFM and X-ray double-crystal diffraction. The influences of surface treatments by mechanically polished, chemicomechanically polished and chemically etched on the surfaces properties of sapphire substrates were studied. The results show that the surface properties of it with CMP, and then chemically etching are best.

关 键 词：蓝宝石 衬底 表面处理 

分 类 号：O78[理学—晶体学]