化学镀Fe-N合金薄膜的研究  

Study on Electroless Plating of Fe-N Alloy Film

作　　者：吉云秀[1] 许阳[1] 公维民[1] 高玉周[2] 

机构地区：[1]大连海事大学环境科学与工程学院,辽宁大连116026 [2]大连海事大学材料工艺研究所,辽宁大连116026

出　　处：《电镀与精饰》2005年第4期33-35,共3页Plating & Finishing

摘　　要：鉴于铁-氮合金薄膜具有优良的软磁性能,以铜片为基体,在碱性条件下制得化学镀铁-氮合金薄膜;并确定了最佳工艺条件:硫酸亚铁铵4g/L、氯化亚铁12g/L、酒石酸钾钠12g/L、水合肼60g/L、pH为12、温度85～90℃;通过X-射线衍射及扫描电镜对镀样的形貌、成分进行初步分析,结果表明化学镀铁-氮合金薄膜是可行的。In view of the excellent soft magnetic property of iron-nitrogen alloy film, iron-nitrogen alloy films were prepared with electroless plating method under alkaline condition on copper sheet substrate. Optimal technological conditions were established: ferrous ammonium sulfate 4 g/L, ferrous chloride 12 g/L, potassium sodium tartarate 12 g/L, hydrate hydrazine 60 g/L, pH 12, temperature 85～90℃. Morphology and compositon of the specimens were analyzed by XRD and SEM. The results show that electroless plating iron-nitrogent alloy film is feasible.

关 键 词：铁-氮薄膜 化学镀 软磁性能 

分 类 号：TQ153.2[化学工程—电化学工业]