光响应性超疏水偶氮苯自组装多层膜的制备及性质研究  

Properties of Photo-responsive Superhydrophobic Azobenzene Multilayers Fabricated by Electrostatic Self-assembly

作　　者：姜武辉[1] 王国杰[2] 和亚宁[3] 安永林[1] 王晓工[3] 宋延林[2] 江雷[2] 

机构地区：[1]大连理工大学化工学院,大连116023 [2]中国科学院化学研究所分子科学中心,北京100080 [3]清华大学化学工程系材料科学与工程研究院,北京100084

出　　处：《高等学校化学学报》2005年第7期1360-1362,M009,共4页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金(批准号:20374054;90306011)资助.

摘　　要：Azobenzene multilayers were fabricated on silicon substrates by electrostatic self-assembly technology. Rough silicon substrates were prepared by photolithography and the inductive coupling plasma deep etching technique. Surface morphology and properties of azobenzene multilayer on the silicon substrate were characterized by SEM, UV-Vis spectra and contact angle(CA) measurement. Superhydrophobicity(CA is larger than 150°) on the multilayer was obtained by introducing geometrical structure onto the substrate surface. For the flat silicon substrate, CA on 10 bilayers was 83.4°±2.1°. For the rough substrate, CA was 150.9°±1.7°. After UV irradiation the CA decreased. A large reversible CA change about 37° was realized through ultraviolet and visible irradiation on the rough azobenzene film, comparing with that about 5° on the flat film. These results indicate that the surface roughness plays an important role in tuning surface wettability. Moreover, the reversible switching by photo-irradiation could be realized many times, and a good reversibility of surface wettability was observed.Azobenzene multilayers were fabricated on silicon substrates by electrostatic self-assembly technology. Rough silicon substrates were prepared by photolithography and the inductive coupling plasma deep etching technique. Surface morphology and properties of azobenzene multilayer on the silicon substrate were characterized by SEM, UV-Vis spectra and contact angle(CA) measurement. Superhydrophobicity(CA is larger than 150°) on the multilayer was obtained by introducing geometrical structure onto the substrate surface. For the flat silicon substrate, CA on 10 bilayers was 83.4°±2.1°. For the rough substrate, CA was 150.9°±1.7°. After UV irradiation the CA decreased. A large reversible CA change about 37° was realized through ultraviolet and visible irradiation on the rough azobenzene film, comparing with that about 5° on the flat film. These results indicate that the surface roughness plays an important role in tuning surface wettability. Moreover, the reversible switching by photo-irradiation could be realized many times, and a good reversibility of surface wettability was observed.

关 键 词：层层自组装 偶氮苯 超疏水性 浸润性 

分 类 号：O631[理学—高分子化学]