半导体激光Fabry-Perot干涉波长的微位移测量仪  

Micro-displacement Measuring Instrument with Semi-conductor Laser Fabry-Perot Interference Wave Length

作　　者：杨秀芳[1] 王小明 刘月明[1] 郭彦珍[1] 

机构地区：[1]西安理工大学机械与精密仪器工程学院,西安710048 [2]西安市政管理委员会,西安710068

出　　处：《光子学报》2005年第6期916-918,共3页Acta Photonica Sinica

摘　　要：设计了一种基于FabryPerot干涉波长测量仪.这种测量仪使用两个FabryPerot干涉腔,其中一个作为测量腔、另一个作为参考腔,测量腔的一个反射面与被测对象安装在一起,参考腔的一个反射面与压电陶瓷安装在一起.根据透射光谱中心波长与其干涉腔长之间的关系,当参考腔与测量腔的透射光谱中心波长完全重合时,对纳米级微位移实现实时测量.光源采用半导体激光器,可获得所需要的波长值和波长变化范围.实验结果表明,这种测量仪测量误差不大于1.5nm,该精度可以满足精密机械加工、光电子和微电子加工以及纳米级测量技术等领域的精度要求.A kind of measuring instrument based on F-P interference wave length is designed. The measuring instrument use double interference cavities. One of interference cavities is reference cavity, the other is measuring cavity. One reflect surface of reference cavity is installed with piezoelectric ceramics, One reflect surface of measuring cavity is erected with an object to be measured. When the central wavelengths in reference Fabry-Perot interference and in measuring Fabry-Perot interference are overlapped, there are the maximum light signal outputs. Based on the relationship between the transmission spectrum central wave length and its interference cavity length, this measuring instrument can be used to realize the real time measurement of Nano-grade micro-displacement. Using simi-conductor laser as the light resource can obtain the required wavelength values and its variation scopes. It can be seen from the measured results that the measured error is not over 1.5 nm. Such a precision can satisfy the precision requirements as in the fields of precision mechanical processing, photoelectronic processing and Nano-grade measuring technology.

关 键 词：Fabry—Perot干涉仪 微位移测量仪 半导体激光 透射光谱 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置]